1. Principle
Observing the micro-relief of a surface is impossible at high magnification with a conventional ("photonic") optical microscope. This is because the separating power (or lateral spatial resolution) is limited to around 0.2 μm and, at maximum magnification of 1,500, the depth of field is limited to around 1 μm. Both depend on the wavelength of the visible radiation and the numerical aperture of the beam, and cannot be improved. This is why the idea of imaging a sample from :
or a beam of electrons sufficiently accelerated for the associated wavelength to be less than a nanometer (transmission electron microscopy, generally referred to as TEM);
or a very fine, almost parallel brush of electrons that sweeps across the sample, using the secondary electrons emitted to form a point-by-point image (scanning electron...
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Principle
Bibliography
Events
GNMEBA: two annual meetings, a thematic meeting in spring and a pedagogical meeting in December in Paris, and every 5-6 years a summer school (the last one took place in 2012 in Lille). http://www.gn.meba.org
EMAS: European congress every 2 years and a regional symposium every 2 years in alternation
Standards and norms
ISO TC202 Microbeam analysis – scanning electron microscopy :
TC202/SC1: terminology
TC202/SC2: microanalysis by electron probe
TC202/SC4: scanning electron microscopy.
Directory
Manufacturers – Suppliers – Distributors (non-exhaustive list)
Scanning electron microscopes
Carl Zeiss SMT http://microscopy.zeiss.com/microscopy/en_de/home.html
FEI Company (FEI France, formerly Philips Optique Électronique)
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