Article | REF: M1654 V1

Magnetron sputtering

Authors: Alain BILLARD, Frédéric PERRY

Publication date: December 10, 2005, Review date: June 4, 2024 | Lire en français

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1. Sputtering in a neutral atmosphere

It was in 1853 that Grove first observed the phenomenon of cathode sputtering, which occurs when an electrical discharge is established under reduced inert gas pressure, with the formation of a thin layer of cathode material on the surface of the anode. It is only in the last thirty years, however, that progress in understanding the physical and physicochemical phenomena involved, and in technological advances in control equipment and generators, have led to the industrial development of this technique for the synthesis of metallic or ceramic coatings.

1.1 Basic mechanisms

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Sputtering in a neutral atmosphere

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Bibliography

(1) - SIGMUND (P.) - Theory of sputtering. - – Phys. Rev., 184 (1969), 383.
(2) - HOFFMAN (D.W.), THORNTON (J.A.) - Internal stresses in sputtered chromium. - Thin Solid Films, 40 (1977), 355.

Organizations

French Atomic Energy Commission (CEA)

French National Center for Scientific Research (CNRS)

Institut National Polytechnique de Lorraine (INPL)

University of Paris Sud

French Vacuum Society (SFV)

Manufacturer – Suppliers – Distributors (non-exhaustive list)

Surface technology – HEF

PVDco

Balzers

Teer Coatings

Alliance Concept

Mecha-2000

Theses

BILLARD (A.) - Étude de la pulvérisation cathodique magnétron des aciers inoxydables austénitiques dans des plasmas réactifs Ar-CH ₄ , N ₂ ou O _2. Caractérisation chimique et structurale des dépôts réalisés. Propriétés des revêtements...