Article | REF: RE263 V1

Input of In situ characterisation in atomic layer deposition (ALD) processes.

Authors: Jean-Luc DESCHANVRES, Carmen JIMENEZ

Publication date: October 10, 2016

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1. Context

As with all development methods, optimizing the desired properties of an ALD-developed functional material is necessarily linked to mastery of the development process. This control can be acquired following a large number of growth experiments analyzed by ex situ and a posteriori techniques. Another way of meeting this demand is to analyze in situ the species created in the gas phase and compare them with thermodynamic calculations [RE252] . The ability to carry out in situ analyses during the growth process provides access to new information and reduces development times. With this...

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