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ABSTRACT
In situ characterisation is the main research approach to improving our understanding and control of the growth mechanisms governing atomic layer deposition (ALD) processes. In this article, the in situ techniques will be presented as a function of the information they can provide about the ALD deposition: first, determination of the ALD window, then reactional mechanisms, and finally correlation of deposition parameters and physical properties of grown films.
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Read the articleAUTHORS
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Jean-Luc DESCHANVRES: CNRS Research Fellow - Affiliation Materials and Physical Engineering Laboratory (LMGP) - Université Grenoble Alpes, LMGP, F-38000 Grenoble, France ; CNRS, LMGP, F-38000 Grenoble, FRANCE.
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Carmen JIMENEZ: CNRS Research Engineer - Affiliation Materials and Physical Engineering Laboratory (LMGP) - Université Grenoble Alpes, LMGP, F-38000 Grenoble, France ; CNRS, LMGP, F-38000 Grenoble, FRANCE.
INTRODUCTION
Domain: Innovation,
Degree of technology dissemination: Emergence | Growth | Maturity Technologies involved : Atomic Layer Deposition (ALD)
Applications: Microelectronics, energy, OLEDs, healthcare,
Main French players :
Competitive clusters: Minalogic, Tenerrdis
Competence centers: OMNT ( https://www.omnt.fr/fr/ )
Manufacturers: OEMs (Encapsulix, Annealsys, Picosun, Beneq)
Other players worldwide :
Contact: [email protected] ; [email protected]
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KEYWORDS
reaction mechanisms | atomic layer deposition | in situ characterization | quartz crystal micro-balance
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The contribution of in situ characterization to ALD processes
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