Article | REF: E6312 V1

Ultrafast laser photoinscription for 3D optical systems

Authors: Razvan STOIAN, Cyril MAUCLAIR

Publication date: October 10, 2018, Review date: August 24, 2021

You do not have access to this resource.
Click here to request your free trial access!

Already subscribed? Log in!


Français

1. Physical mechanisms of laser photoinscription

A controlled photoinscription process is necessarily based on a good understanding of the properties of femtosecond laser pulses and their interaction with matter. Such a process makes it possible to obtain controllable structures in three dimensions down to the nanometric scale. The basic aspects of this interaction and the first experimental demonstration of refractive index modification by ultra-short laser pulses are covered here

You do not have access to this resource.

Exclusive to subscribers. 97% yet to be discovered!

You do not have access to this resource.
Click here to request your free trial access!

Already subscribed? Log in!


The Ultimate Scientific and Technical Reference

A Comprehensive Knowledge Base, with over 1,200 authors and 100 scientific advisors
+ More than 10,000 articles and 1,000 how-to sheets, over 800 new or updated articles every year
From design to prototyping, right through to industrialization, the reference for securing the development of your industrial projects

This article is included in

Optics and photonics

This offer includes:

Knowledge Base

Updated and enriched with articles validated by our scientific committees

Services

A set of exclusive tools to complement the resources

Practical Path

Operational and didactic, to guarantee the acquisition of transversal skills

Doc & Quiz

Interactive articles with quizzes, for constructive reading

Subscribe now!

Ongoing reading
Physical mechanisms of laser photoinscription