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7. Glossary
ALD; Atomic Layer Deposition
Alternating-flow chemical vapor deposition technique, based on self-limiting surface reactions, for fine control of film thickness, composition and specific characteristics (uniformity, conformality).
adsorption; adsorption
Term describing the interaction between a gaseous or liquid species (adsorbate) and a surface (adsorbent). It can be physical (physisorption) or chemical (chemisorption).
ALD window; ALD window
Temperature range in which deposition rate is constant and growth is ALD-like.
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Glossary
Acronyms, notations and symbols
Bibliography
Websites
ALD Pulse
http://aldpulse.com/ (page consulted on June 2, 2016)
BALD Engineering
http://www.baldengineering.com/ (page consulted on June 2, 2016)
Virtual Project on the History of ALD...
Events
AVS-ALD conference, congress (conferences + trade show) held each year on a different continent.
Baltic-ALD conference, held every other year in a European city
Patents
Method for producing compound thin films, US. Patent 4 058 430 (1977).
Directory
Organizations – Federations – Associations (non-exhaustive list)
RafALD, French ALD Players' Network
HERALD, Hooking together European research in Atomic Layer Deposition
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