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2. General principle of ALD
2.1 ALD basics
2.1.1 Chemical Vapor Deposition
ALD is a recent variation on a technique developed as far back as the 1920s, Chemical Vapor Deposition (CVD) . In a CVD process, the interaction between the flow of a gas mixture and a heated substrate leads to the growth of a thin film. In the case of ideal...
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General principle of ALD
ALD process
Bibliography
Websites
ALD Pulse
http://aldpulse.com/ (page consulted on June 2, 2016)
BALD Engineering
http://www.baldengineering.com/ (page consulted on June 2, 2016)
Virtual Project on the History of ALD...
Events
AVS-ALD conference, congress (conferences + trade show) held each year on a different continent.
Baltic-ALD conference, held every other year in a European city
Patents
Method for producing compound thin films, US. Patent 4 058 430 (1977).
Directory
Organizations – Federations – Associations (non-exhaustive list)
RafALD, French ALD Players' Network
HERALD, Hooking together European research in Atomic Layer Deposition
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