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3. Reactor architectures
In this section, we'll look at the different reactor architectures that have been able to achieve the nanoscopic conditions required for an ALD process in a R&D or plant environment. Two major approaches can be distinguished: one has a substrate remaining in place during deposition, and moving gases. This approach is called temporal ALD. The second approach has a stationary gas and a moving substrate. This approach is called spatial ALD. Spatial ALD will be discussed in detail in [
3.1 Temporary...
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Reactor architectures
Precursor steam generation and dosing
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