Article | REF: RE262 V1

Spatial Atomic Layer Deposition (SALD)

Author: David MUÑOZ-ROJAS

Publication date: November 10, 2016

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2. Keeping precursors separate: SALD frames

The spatial approach has proved to be very versatile from a technical point of view since many reactors have been listed to date. S. Nonobe et al. proposed a horizontal quartz space reactor (see figure 1 in ) for the growth of HfO 2 films on 10 mm × 10 mm silicon substrates . HfCI 4 (evaporated at 433 K) and O 2 are introduced into opposite...

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Keeping precursors separate: SALD frames