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Article | REF: IN164 V1

Raman diffusion spectrometry under extreme conditions

Authors: Aurélien CANIZARES, Patrick SIMON, Guillaume GUIMBRETIERE

Publication date: September 10, 2013

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ABSTRACT

This article, dedicated to the Raman diffusion spectroscopy applied to extreme conditions, presents the state-of-the-art Raman instrumentation and methodology through the latest technological developments. The issues related to extreme conditions are also discussed. Examples of applications in hostile environments (structural relaxation of silicon during annealing, followed by the in-situ alteration of uranium dioxide by radiolysis) illustrate the subject matter.

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AUTHORS

  • Aurélien CANIZARES: Spectroscopic development engineer Laboratoire CEMHTI (Conditions extrêmes et matériaux : haute température et irradiation), UPR3079 CNRS

  • Patrick SIMON: Research Director, Laboratoire CEMHTI UPR3079 CNRS

  • Guillaume GUIMBRETIERE: Research Associate CEMHTI Laboratory UPR3079 CNRS

 INTRODUCTION

Key points

Field: analytical techniques

Degree of technology diffusion: Emergence | Growth | Maturity

Technologies involved: Raman scattering spectroscopy, particle gas pedal, cyclotron

Applications: materials, nuclear, geology, high temperatures

Main French players :

Manufacturers: Renishaw, Horiba Jobin Yvon, Andor Technology, Bruker Corp, Jasco, Thermo Scientific, BW Tech, BaySpec, Kaiser Optical System

Other players worldwide :

Contact: [email protected]

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Raman scattering spectroscopy under extreme conditions
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