Article | REF: IN251 V1

Bipolar high-power impulse magnetron sputtering

Authors: Matthieu MICHIELS, Stephanos KONSTANTINIDIS, Dominique DECKERS

Publication date: September 10, 2023

You do not have access to this resource.
Click here to request your free trial access!

Already subscribed? Log in!


Français

4. Effect of cathode electromagnetic field on plasma properties

It is well known that the properties of thin films are strongly correlated to the energy per deposited atom, as demonstrated by various publications . During plasma/surface interaction, energy can be transferred...

You do not have access to this resource.

Exclusive to subscribers. 97% yet to be discovered!

You do not have access to this resource.
Click here to request your free trial access!

Already subscribed? Log in!


The Ultimate Scientific and Technical Reference

A Comprehensive Knowledge Base, with over 1,200 authors and 100 scientific advisors
+ More than 10,000 articles and 1,000 how-to sheets, over 800 new or updated articles every year
From design to prototyping, right through to industrialization, the reference for securing the development of your industrial projects

This article is included in

Metal treatments

This offer includes:

Knowledge Base

Updated and enriched with articles validated by our scientific committees

Services

A set of exclusive tools to complement the resources

Practical Path

Operational and didactic, to guarantee the acquisition of transversal skills

Doc & Quiz

Interactive articles with quizzes, for constructive reading

Subscribe now!

Ongoing reading
Effect of cathode electromagnetic field on plasma properties