![](/assets/images/picto-drapeau-france-3a76576a5d60a512053b4612ab58dae5.png)
2. General principle of ALD
2.1 ALD basics
2.1.1 Chemical Vapor Deposition
ALD is a recent variation on a technique developed as far back as the 1920s, Chemical Vapor Deposition (CVD) . In a CVD process, the interaction between the flow of a gas mixture and a heated substrate leads to the growth of a thin film. In the case of ideal...
Exclusive to subscribers. 97% yet to be discovered!
You do not have access to this resource.
Click here to request your free trial access!
Already subscribed? Log in!
![](/assets/images/logo-eti-286623ed91fa802ce039246e516e5852.png)
The Ultimate Scientific and Technical Reference
This article is included in
Metal treatments
This offer includes:
Knowledge Base
Updated and enriched with articles validated by our scientific committees
Services
A set of exclusive tools to complement the resources
Practical Path
Operational and didactic, to guarantee the acquisition of transversal skills
Doc & Quiz
Interactive articles with quizzes, for constructive reading
General principle of ALD
Bibliography
Websites
ALD Pulse
http://aldpulse.com/ (page consulted on June 2, 2016)
BALD Engineering
http://www.baldengineering.com/ (page consulted on June 2, 2016)
Virtual Project on the History of ALD...
Events
AVS-ALD conference, congress (conferences + trade show) held each year on a different continent.
Baltic-ALD conference, held every other year in a European city
Patents
Method for producing compound thin films, US. Patent 4 058 430 (1977).
Directory
Organizations – Federations – Associations (non-exhaustive list)
RafALD, French ALD Players' Network
HERALD, Hooking together European research in Atomic Layer Deposition
Exclusive to subscribers. 97% yet to be discovered!
You do not have access to this resource.
Click here to request your free trial access!
Already subscribed? Log in!
![](/assets/images/logo-eti-286623ed91fa802ce039246e516e5852.png)
The Ultimate Scientific and Technical Reference