Article | REF: RE260 V1

Plasma Enhanced Atomic Layer Deposition

Author: Christophe VALLEE

Publication date: October 10, 2016

You do not have access to this resource.
Click here to request your free trial access!

Already subscribed? Log in!


Français

4. Glossary

PE ALD; plasma enhanced atomic layer deposition

Plasma-assisted atomic layer deposition.

CVD; chemical vapor deposition

Chemical vapor deposition.

OES; optical emission spectroscopy

Optical emission spectroscopy is used to identify radiatively de-excited species in plasma.

ICP; inductively coupled plasma

Reactor using an inductive source to create the plasma discharge.

TEM; transmission electron microscopy

Transmission electron microscopy (TEM) is a chemical characterization and imaging technique based on the passage of an electron beam through a thin sample.

XRD; X-Ray diffraction

X-ray diffraction is a method of analysis...

You do not have access to this resource.

Exclusive to subscribers. 97% yet to be discovered!

You do not have access to this resource.
Click here to request your free trial access!

Already subscribed? Log in!


The Ultimate Scientific and Technical Reference

A Comprehensive Knowledge Base, with over 1,200 authors and 100 scientific advisors
+ More than 10,000 articles and 1,000 how-to sheets, over 800 new or updated articles every year
From design to prototyping, right through to industrialization, the reference for securing the development of your industrial projects

This article is included in

Technological innovations

This offer includes:

Knowledge Base

Updated and enriched with articles validated by our scientific committees

Services

A set of exclusive tools to complement the resources

Practical Path

Operational and didactic, to guarantee the acquisition of transversal skills

Doc & Quiz

Interactive articles with quizzes, for constructive reading

Subscribe now!

Ongoing reading
Glossary