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ABSTRACT
Nanostructuring by thin layers of different interfacial areas in high temperature fuel cells, in particular solid oxide (SOFCs), is a key aspect for improving the performance and lifetime of these devices for energy generation. Atomic layer deposition (ALD) is among the most efficient techniques for processing very high quality, homogeneous, dense and conformant thin films. This review shows the advances and the potential of ALD, mainly in SOFC systems, but also for molten carbonate fuel cells (MCFCs) and proton conductor solid oxide fuel cells (PCFCs).
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Read the articleAUTHORS
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Michel CASSIR: Professor - Chimie ParisTech, PSL Research University, CNRS, Institut de Recherche de Chimie Paris (IRCP), F-75005 Paris, France
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Dorra DALLEL: Post-doctoral researcher - Chimie ParisTech, PSL Research University, CNRS, Institut de Recherche de Chimie Paris (IRCP), F-75005 Paris, France
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Arturo MELENDEZ-CEBALLOS: Doctoral student - Chimie ParisTech, PSL Research University, CNRS, Institut de Recherche de Chimie Paris (IRCP), F-75005 Paris, France
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Marie-Hélène CHAVANNE: Design Engineer - Chimie ParisTech, PSL Research University, CNRS, Institut de Recherche de Chimie Paris (IRCP), F-75005 Paris, France
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Armelle RINGUEDE: Research Manager - Chimie ParisTech, PSL Research University, CNRS, Institut de Recherche de Chimie Paris (IRCP), F-75005 Paris, France
INTRODUCTION
Functionalized thin films (ultra-thin electrolytes, diffusion barriers, electronic barriers, catalysts, etc.) play a key role in new generations of fuel cells, particularly high-temperature ones (SOFC, MCFC, PCFC, etc.). Among deposition techniques, atomic layer deposition (ALD) is particularly well suited to enhancing the performance of the electrochemical generators mentioned. Its effectiveness has been demonstrated in SOFC applications for less than twenty years. ALD is a must for micro-SOFC systems, where thin-film integration is the key issue. However, ALD is also acquiring a leading position in larger systems for stationary production of electrical and thermal energy, where this technique is positioned more at the level of interfacial layers responsible for high performance. The role of ALD in developing corrosion protection layers for electrodes or interconnect plates is also introduced in the case of MCFC cathodes. ALD is potentially of great interest in PCFCs and high-temperature electrolyzers.
Field: Electrochemical power generation
Degree of technology diffusion: Emergence and Growth
Technologies involved : High-temperature fuel cells
Applications: Clean energy
Main French players :
Competitive clusters: Grenoble Alpes Métropole, PHYRENEES, Pôle Véhicule du futur, TENNERDIS, etc.
Competence centers: All information can be found on the websites of the Association Française pour l'Hydrogène ( http://www.afhypac.org ) and the GDR HYSPAC ( http://www.gdr-hyspac.cnrs )
Manufacturers: Dassault, Air Liquide, EDF, GDF, HELION, Axane, Paxitech, MCPHY Energy, etc.
Other global players: FCE (Fuel Cell Energy), Delphi, Bloom Energy (USA), Solidpower (Italy), POSCO (South Korea), Mitsubishi Heavy Industries and Toshiba (Japan), BMW (Germany), etc.
Contact: [email protected]
The Ultimate Scientific and Technical Reference
KEYWORDS
fuel cell | atomic layer deposition | high temperature fuel cell | SOFC | MCFC | PCFC
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ALD for high-temperature fuel cells
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