Article | REF: M1627 V1

Pulsed current electrodeposition

Author: Bernadette NGUYEN

Publication date: December 10, 1998, Review date: February 1, 2016

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6. Examples of industrial-scale applications

Industrial applications of pulsed regimes are mainly aimed at improving the crystalline quality of deposits, as well as uniformity of thickness and/or composition in the case of alloys. These objectives take advantage of the favorable effect of high current densities on germination kinetics 2.4 and of short pulses on interfacial replenishment of metal species...

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Examples of industrial-scale applications