Article | REF: NM556 V1

Near-field nanophotolithography

Author: Renaud BACHELOT

Publication date: October 10, 2007

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4. Near-field nanophotolithography

In order to implement near-field nanophotolithography, three key points had to be addressed:

  • knowledge and quality (power and size) of the optical source ;

  • the intrinsic response of the photosensitive material;

  • the distance between the material and the source.

Principle and triple motivation of near-field nanophotolithography
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Near-field nanophotolithography