1. FDSOI Technology
1.1 Advantages of FDSOI
The FDSOI (Fully Depleted Silicon-On-Insulator MOSFET) technology has very great advantages over transistors made on bulk Si or on partially depleted Silicon On Insulator (SOI) layers. In particular, the possible integration down to decananometric gate lengths, a substantial reduction in energy consumption at the same operating frequency, the possibility of operating with good performance and without significant parasitic effects over a wide temperature range (4 K - 600 K), the reduction of the variability of electrical properties due to the use of undoped channels, its utility in DRAM, SRAM, nonvolatile memory applications, the design flexibility of SOI circuits, as well as the possible development of additional functionalities in this platform, particularly...
Exclusive to subscribers. 97% yet to be discovered!
You do not have access to this resource.
Click here to request your free trial access!
Already subscribed? Log in!
The Ultimate Scientific and Technical Reference
This article is included in
Electronics
This offer includes:
Knowledge Base
Updated and enriched with articles validated by our scientific committees
Services
A set of exclusive tools to complement the resources
Practical Path
Operational and didactic, to guarantee the acquisition of transversal skills
Doc & Quiz
Interactive articles with quizzes, for constructive reading
FDSOI Technology
Sources bibliographiques
Websites
Exclusive to subscribers. 97% yet to be discovered!
You do not have access to this resource.
Click here to request your free trial access!
Already subscribed? Log in!
The Ultimate Scientific and Technical Reference