4. Glossary

ALD; atomic layer deposition

Atomic layer deposition. Chemical vapor deposition process. Based on sequential exposure of the substrate to two (or more) precursors, this technique enables uniformly three-dimensional structures to be covered.

APCVD; atmospheric pressure chemical vapor deposition

Chemical vapor deposition at atmospheric pressure.

CVD; chemical vapor deposition

Chemical Vapor Deposition. A method of depositing thin films from chemical precursors in a vacuum. Unlike ALD, in CVD the precursor chemicals are injected simultaneously and react together on the surface.

FTO ;fluorine tin oxide

Fluorine-doped tin oxide. Transparent, conductive material used in dye-sensitized photovoltaic cells.

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Bibliography

(1) - FUJISHIMA (A.), HONDA (K.) - Electrochemical Photolysis of Water at a Semiconductor Electrode. - Nature, vol. 238, 37-38 (1972).
(2) - PRÉVOT (M.S.), SIVULA (K.) - Photoelectrochemical Tandem Cells for Solar Water Splitting. - J. Phys....

Websites

Linkedin group Atomic Layer Deposition, professional social network

http://www.linkedin.com/groups?about=&gid=1885076 (page consulted on March 31, 2016)

Jonas Sundqvist's blog on ALD news

http://www.blog.baldengineering.com...

Events

Conference: International Conference on Atomic Layer Deposition, held every year in alternating years in the USA, Europe and Asia.

Conference: International Baltic Conference on Atomic Layer Deposition, a European conference on ALD processes, is held almost every year in a Baltic country.

Conference: Electrochemical Society Symposium on Atomic Layer Deposition...