Article | REF: NM556 V1

Near-field nanophotolithography

Author: Renaud BACHELOT

Publication date: October 10, 2007

You do not have access to this resource.
Click here to request your free trial access!

Already subscribed? Log in!


Français

4. Near-field nanophotolithography

In order to implement near-field nanophotolithography, three key points had to be addressed:

  • knowledge and quality (power and size) of the optical source ;

  • the intrinsic response of the photosensitive material;

  • the distance between the material and the source.

Principle and triple motivation of near-field nanophotolithography
You do not have access to this resource.

Exclusive to subscribers. 97% yet to be discovered!

You do not have access to this resource.
Click here to request your free trial access!

Already subscribed? Log in!


The Ultimate Scientific and Technical Reference

A Comprehensive Knowledge Base, with over 1,200 authors and 100 scientific advisors
+ More than 10,000 articles and 1,000 how-to sheets, over 800 new or updated articles every year
From design to prototyping, right through to industrialization, the reference for securing the development of your industrial projects

This article is included in

Nanosciences and nanotechnologies

This offer includes:

Knowledge Base

Updated and enriched with articles validated by our scientific committees

Services

A set of exclusive tools to complement the resources

Practical Path

Operational and didactic, to guarantee the acquisition of transversal skills

Doc & Quiz

Interactive articles with quizzes, for constructive reading

Subscribe now!

Ongoing reading
Near-field nanophotolithography