![](/assets/images/picto-drapeau-france-3a76576a5d60a512053b4612ab58dae5.png)
1. Context
ALD was first developed in Finland in the early 1970s to meet a need in the electroluminescent panel industry (TFELs). To develop these products, it was necessary to deposit high-quality dielectric and luminescent thin films on large surfaces. The conventional deposition processes used at the time, such as evaporation or sputtering, did not meet these requirements.
T. Suntola and his team came up with the idea of depositing a material with the desired properties, ZnS, brick by brick, starting with elementary precursors (zinc and sulfur). In this way, precise thickness control could be achieved even over a large surface area. The ALE (Atomic Layer Epitaxy) technique was born.
From the 2000s onwards, ALE became ALD (Atomic Layer Deposition), as most deposition was by self-limiting surface reaction rather than epitaxy. For reasons of process...
Exclusive to subscribers. 97% yet to be discovered!
You do not have access to this resource.
Click here to request your free trial access!
Already subscribed? Log in!
![](/assets/images/logo-eti-286623ed91fa802ce039246e516e5852.png)
The Ultimate Scientific and Technical Reference
This article is included in
Nanosciences and nanotechnologies
This offer includes:
Knowledge Base
Updated and enriched with articles validated by our scientific committees
Services
A set of exclusive tools to complement the resources
Practical Path
Operational and didactic, to guarantee the acquisition of transversal skills
Doc & Quiz
Interactive articles with quizzes, for constructive reading
Context
Bibliography
Websites
ALD Pulse
http://aldpulse.com/ (page consulted on June 2, 2016)
BALD Engineering
http://www.baldengineering.com/ (page consulted on June 2, 2016)
Virtual Project on the History of ALD...
Events
AVS-ALD conference, congress (conferences + trade show) held each year on a different continent.
Baltic-ALD conference, held every other year in a European city
Patents
Method for producing compound thin films, US. Patent 4 058 430 (1977).
Directory
Organizations – Federations – Associations (non-exhaustive list)
RafALD, French ALD Players' Network
HERALD, Hooking together European research in Atomic Layer Deposition
Exclusive to subscribers. 97% yet to be discovered!
You do not have access to this resource.
Click here to request your free trial access!
Already subscribed? Log in!
![](/assets/images/logo-eti-286623ed91fa802ce039246e516e5852.png)
The Ultimate Scientific and Technical Reference