Article | REF: M1643 V2

Laser selective surface metallization

Author: Armel BAHOUKA

Publication date: December 10, 2017

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2. Classic techniques

2.1 Chemical deposition (gas and liquid phase)

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2.1.1 CVD

CVD (Chemical Vapor Deposition) is a gas-phase thin-film deposition technique in which gaseous precursors interact with the substrate surface, either by reaction or decomposition, to form the desired metallic thin-film. The use of RF-generated plasma in this procedure directly activates both the substrate surface and the metal precursor gases that will create the thin film.

Combined with plasma to improve performance, this technique...

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