2. Thin-film CMOS technologies
From the 28/20 nm technology nodes onwards, the technology used to manufacture CMOS chips has shifted from bulk to thin-film silicon technologies. In fact, these are the only technologies used today in advanced technology nodes. The reason is simple: with the scaling of transistor geometrical dimensions from one technology node to the next, and the end of Dennard's scaling law in 2003, it became increasingly difficult to ensure electrostatic control of the MOS transistor channel. The transistors' electrical characteristics were deteriorating, particularly leakage currents, due to leakage deep into the silicon substrate, uncontrolled by the gate. The specifications in terms of the ratio I ON /I OFF could no longer be met: this ratio is important because the numerator, which is the current delivered...
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Thin-film CMOS technologies
Bibliography
- (1) - HIPEAC - . – Hipeac Vision (2017).
- (2) - GARGINI (P.) - The Roadmap to Success : ITRS Update. - http://www.ewh.ieee.org/r6/scv/eds/slides/2014-Mar-11-Paolo.pdf...
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Main conferences dedicated to semiconductor technology (there are many):
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IRPS: International Reliability Physics Symposium
ESSDERC: European Solid-State Device Conference
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All semiconductor industry standards are managed by the IEEE (Institute of Electrical and Electronics Engineers). This is the largest professional association dedicated to the technology. The standards in question are highly varied and cover a wide spectrum, with the best-known among them :
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IEEE 1076: VHDL – VHSIC Hardware Description...
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