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2. Deposit parameters
2.1 Precursor materials
The target must contain the chemical elements of the material you wish to deposit in a thin film. In the case of oxides, an oxide target (e.g. CuO target for Cu 2 O deposition; CuO is more chemically stable than Cu 2 O) is preferred to a metal target (e.g. Cu) mainly due to the greater difficulty in ablating metals than oxides. This target, for example 1′′ in size and 3 mm thick, can be purchased commercially (a target dedicated to sputtering may be suitable, or even a large substrate purchased commercially), or made yourself.
In the case of oxides, the simplest method is the sintering route: this involves grinding powders of the precursor molecules,...
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Deposit parameters
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